원소 구분
Element | Product name | Application |
---|---|---|
Al | TMA | Capacitor/gate high-k |
DMEAA , MPA , DMAH | Interconnection metal | |
C | 1-hexene | Hard mask ACL |
Co | CCTBA , CpCo(CO)2 | Contact metal |
Hf | TEMAHf , CpHf , Hf(OtBu)4 | Capacitor/gate high-k |
Ni | NiEtCp2 | Contact metal |
Ru | RuEtCp2 | Capacitor electrode, barrier metal |
Si | DIPAS , BDEAS | DPT ULTO, gap fill Sio2, gate SIO2/SiN |
Tri-DMAS | Gate SIO2/SiN, gap fill SiO2 | |
BTBAS | Gate SIO2/SiN | |
HCDS | DPT ULTO | |
3TMS , 4TMS | Hard mask SiON | |
Ta | TBTDETa , TBTEMTa , CpTa | Gate high-k barrier metal |
Ti | Cp*Ti(OMe)3 | Capacitor high-k |
TiCl4 | Capacitor electrode, barrier metal | |
TDMAT | Capacitor electrode, barrier metal | |
W | TBDMW | Contact metal |
Zr | TEMAZr , CpZr | Capacitor/gate high-k |
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